MEMS
Service
IWS now offers processing services and consulting
for MEMS / MST and Micromachining
Process capabilities include:
Deposition Processes (Capabilities for multiple
sized wafers)
- LPCVD/PECVD
- LSN
- SiO2 (LTO/HTO)
- Si3N4
- Poly Si
- Thermal Oxidation
- Thermal Annealing
- Metallization (e-beam and sputtered)
- Au, Pt, Ti, Cr, TiN, TaN, Ag, Ni, Pd, W, Al,
Au/Sn
- Liftoff and Shadow masking
Etch Processes (Capabilities for multiple
sized wafers)
- RIE/DRIE
- Si
- SiO2
- Si3N4
- Ti
- Others
- Wet-etching
- Wet etch chemistries for most materials and
substrates
- Wet anisotropic Bulk Silicon micromachining
for <100> and <110> orientations
Lithography
- Contact and Step printing
- Multiple layer capability
- Backside processing available
- Feature size CDs to 1um
Design / process development
- Bulk micromachining, Surface micromachining,
and MEMS
Other
- Precision Lapping
- Wafer bonding
- high precision dicing
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